Check out our wide range of high performance materials for photonic applications

Application for devices
Filter by
Purification techniques
Purification techniques
Home » Compounds » EBL

EBL

2-TNATA

Cas number: 185690-41-9
Synonyms: 2TNATA, 2T-NATA, 4,4′,4′′-Tris[2-naphthyl(phenyl)amino] triphenylamine
Purity: Sublimed: >99.0% (HPLC)
Chemical Formula: C66H48N4

BCBP

Cas number: 858131-70-1
Synonyms: 2,2'-Bis(4-carbazolylphenyl)-1,1'-biphenyl
Purity: Sublimed: >99.0% (HPLC)
Chemical Formula: C48H32N2

BCzTPA

Cas number: 1032174-52-9
Synonyms: 4,4'-[3,3'-bi-9H-carbazole]-9,9'-diylbis[N,N-diphenyl-benzenamine]
Purity: Sublimed: >99.0% (HPLC)
Chemical Formula: C60H42N4

CDBP

Cas number: 120260-01-7
Synonyms: 9-[4-(4-Carbazol-9-yl-2-methylphenyl)-3-methylphenyl]carbazole, 9,9'-(2,2'-Dimethylbiphenyl-4,4'-diyl)bis(9H-carbazole)
Purity: Sublimed: >99.0% (HPLC)
Chemical Formula: C38H28N2

CzSi

Cas number: 898546-82-2
Synonyms: 1,3,5-Tris(1-phenyl-1Hbenzimidazol-2-yl)benzene
Purity: Sublimed: >99.0% (HPLC)
Chemical Formula: C58H49NSi2

DNTPD

Cas number: 199121-98-7
Synonyms: N,N'-Bis{4-[bis(3-methylphenyl)amino]phenyl}-N,N'-diphenyl-4,4'-biphenyldiamine
Purity: Sublimed: >99.0% (HPLC)
Chemical Formula: C64H54N4

DPAVBi

Cas number: 119586-44-6
Synonyms: 4,4'-[Biphenyl-4,4'-diyldi(E)ethene-2,1-diyl]bis[N,N-bis(4-methylphenyl)aniline]
Purity: Sublimed: >99.0% (HPLC)
Chemical Formula: C56H48N2

DPVBi

Cas number: 142289-08-5
Synonyms: 4,4'-Bis(2,2-diphenylvinyl)biphenyl, 4,4'-Bis(2,2-diphenylethenyl)-1,1'-biphenyl
Purity: Sublimed: >99.0% (HPLC)
Chemical Formula: C₄₀H₃₀

DTAF

Cas number: 159526-57-5
Synonyms: 4,4′-(9H-Fluorene-9,9-diyl)bis(N,N-di-p-tolylaniline), 9,9-Di[4-(di-p-tolyl)aminophenyl]fluorine
Purity: Sublimed: >99.0% (HPLC)
Chemical Formula: C53H44N2

F4TCNQ

Cas number: 29261-33-4
Synonyms: F4-TCNQ, (2,3,5,6-Tetrafluoro-2,5-cyclohexadiene-1,4-diylidene)dimalononitrile, 7,7,8,8-Tetracyano-2,3,5,6-tetrafluoroquinodimethane
Purity: Sublimed: >99%
Chemical Formula: C12F4N4

HATCN

Cas number: 105598-27-4
Synonyms: HAT-CN6, Dipyrazino[2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile
Purity: Sublimed: >99%
Chemical Formula: C18}N{12}

m-MTDATA

Cas number: 124729-98-2
Synonyms: 4,4',4''-Tris[(3-methylphenyl)phenylamino]triphenylamine
Purity: Sublimed: >98%
Chemical Formula: C57H48N4

mCP

Cas number: 550378-78-4
Synonyms: N,N′-Dicarbazolyl-3,5-benzene
Purity: Sublimed: >99.5% (HPLC)
Chemical Formula: C30H20N2

mCPCN

Cas number: 1392506-99-8
Synonyms: mCP-CN
Purity: Sublimed: >99.0% (HPLC)
Chemical Formula: C31H19N3

NPB

Cas number: 123847-85-8
Synonyms: NPD, α-NPB, α-NPD, N,N′-Bis(naphthalen-1-yl)-N,N′-bis(phenyl)benzidine
Purity: Sublimed: >99.5% (HPLC)
Chemical Formula: C44H32N2

NPB-DPA

Cas number: 910058-11-6
Synonyms: N,N'-Bis[4-(diphenylamino)phenyl]-N,N'-di(1-naphthyl)benzidine, N,N’-Bis[4-(diphenylamino)phenyl]-N,N’-di-1-naphthalenyl-[1,1′-biphenyl]-4,4′-diamine
Purity: Sublimed: >99.0% (HPLC)
Chemical Formula: C68H50N4

NPNPB

Cas number: 936355-01-0
Synonyms: N,N'-Bis[4-(diphenylamino)phenyl]-N,N'-diphenyl-3,3'-biphenyldiamine
Purity: Sublimed: >99%
Chemical Formula: C60H46N4

PDINO

Cas number: 1558023-86-1
Synonyms: PDI-NO, 3,3'-(1,3,8,10-Tetraoxoanthra[2,1,9-def:6,5,10-d'e'f']diisoquinoline-2,9(1H,3H,8H,10H)-diyl)bis(N,N-dimethylpropan-1-amine oxide)
Purity: 98% (1H NMR)
Chemical Formula: C34H32N4O6

PPDN

Cas number: 215611-93-1
Synonyms: 1,3,5-Tris(1-phenyl-1Hbenzimidazol-2-yl)benzene
Purity: Sublimed: >99.0% (HPLC)
Chemical Formula: C41H27N3

Spiro-OMeTAD

Cas number: 207739-72-8
Synonyms: Spiro-MeOTAD, N2,N2,N2′,N2′,N7,N7,N7′,N7′-Octakis(4-methoxyphenyl)-9,9′-spirobi[9H-fluorene]-2,2′,7,7′-tetramine
Purity: Sublimed: >99.5% (HPLC)
Chemical Formula: C81H68N4O8

Spiro-TTB

Cas number: 515834-67-0
Synonyms: N2,N2,N2′,N2′,N7,N7,N7′,N7′-Octa-p-tolyl-9,9′-spirobi[fluorene]-2,2′,7,7′-tetraamine, 2,2′,7,7′-Tetra(N, N-di-tolyl)amino-spiro-bifluorene
Purity: >98.0% (HPLC)
Chemical Formula: C81H68N4

TAPC

Cas number: 58473-78-2
Synonyms: 1,1-Bis[(di-4-tolylamino)phenyl]cyclohexane, Di-[4-(N,N-di-p-tolyl-amino)-phenyl]cyclohexane
Purity: Sublimed: >99.5%
Chemical Formula: C46H46N2

TCNQ

Cas number: 1518-16-7
Synonyms: (2,5-Cyclohexadiene-1,4-diylidene)-dimalononitrile, 2,2'-(2,5-Cyclohexadiene-1,4-diylidene)bismalononitrile
Purity: Sublimed: >99%
Chemical Formula: C12H4N4

TCP

Cas number: 148044-07-9
Synonyms: TCB, tCP, 1,3,5-Tris(N-carbazolyl)benzene
Purity: Sublimed: >99.0% (HPLC)
Chemical Formula: C42H27N3

EBL – Electron Blocking Layer Materials for Enhanced OLED Performance

Electron blocking layer (EBL) materials provide critical charge confinement at the anode side of OLED devices, preventing electron leakage from the emissive zone and maximizing radiative recombination efficiency. Noctiluca supplies premium EBL compounds engineered for phosphorescent, fluorescent, and TADF organic light-emitting diodes—delivering the high triplet energy and precise energy level alignment that demanding device architectures require.

The Role of Electron Blocking Layers

In multilayer OLED architectures, the electron blocking layer sits between the hole transport layer (HTL) and the emissive layer (EML). This strategic positioning serves essential device functions:

  • Electron confinement – preventing electrons from escaping the emission zone toward the anode, where they would cause parasitic HTL emission or non-radiative losses
  • Exciton blocking – containing singlet and triplet excitons within the EML for maximum light output
  • Hole transmission – allowing unimpeded hole flow from HTL into the emissive layer
  • Interface optimization – providing favorable energy level transitions between transport and emission zones

Without effective electron blocking, devices suffer from reduced quantum efficiency, color coordinate shifts due to unwanted HTL emission, and accelerated degradation pathways. These effects become especially pronounced in blue phosphorescent OLEDs where electron leakage into the HTL produces characteristic emission contamination.

Critical Material Requirements

Effective EBL materials must satisfy stringent electronic criteria:

PropertyRequirementPurpose
High LUMO level>-2.5 eV (shallow)Creates electron injection barrier
Appropriate HOMOAligned with HTL/EMLEnables efficient hole transport
High triplet energy (ET)>2.7 eV for blue devicesPrevents triplet exciton quenching
Hole mobility>10⁻⁵ cm²/VsMaintains hole current density
Wide bandgap>3.0 eV typicalEnsures exciton confinement
Thermal stabilityTg >100°CPrevents morphological degradation

The shallow LUMO level represents the defining characteristic—it creates an energy barrier that electrons cannot surmount, forcing them to remain within the emission zone where productive recombination occurs.

Mechanism of Electron Blocking

Electron blocking layer materials function through carefully engineered energy level misalignment:

  1. LUMO barrier formation – The high-lying LUMO of EBL materials creates a substantial energy step relative to the EML, blocking electron injection into the blocking layer
  2. Hole transmission pathway – HOMO alignment between HTL, EBL, and EML permits continuous hole flow without injection barriers
  3. Triplet confinement – High triplet energy prevents Dexter energy transfer from EML triplet excitons to the EBL
  4. Recombination zone control – By blocking electrons at the anode side, EBL materials help position the recombination zone optimally within the EML

This asymmetric blocking—permitting holes while rejecting electrons—complements the Hole Blocking Layer (HBL) function at the cathode side, creating balanced charge confinement.

Featured EBL Materials

Noctiluca offers proven electron blocking compounds with verified performance characteristics:

MaterialCAS NumberLUMO (eV)ET (eV)Tg (°C)Key Features
TCTA139092-78-7-2.42.76151Industry standard, multifunctional
TAPC58473-78-2-2.02.9878Highest ET, blue PHOLED optimized
mCP550378-78-4-2.42.9165High ET, also serves as host
Tris-PCz1141757-83-6-2.32.90130Carbazole trimer, high stability
CzSi898546-82-2-2.13.02131Silicon-bridged, ultra-high ET
DCDPA-2.22.90109Excellent thermal stability
NPB123847-85-8-2.32.2998Lower ET, green/red devices

TCTA: The Versatile Standard

Tris(4-carbazoyl-9-ylphenyl)amine (TCTA) represents the most widely deployed electron blocking layer material, offering an exceptional balance of properties:

  • High LUMO (-2.4 eV) – effective electron blocking capability
  • Suitable triplet energy (2.76 eV) – compatible with most phosphorescent emitters
  • Excellent thermal stability (Tg = 151°C) – superior morphological integrity
  • Multifunctionality – serves as EBL, HTL, and host material depending on device architecture

TCTA’s tricarbazole structure provides the high triplet energy essential for confining phosphorescent excitons while maintaining adequate hole mobility for efficient charge transport.

TAPC: Maximum Triplet Energy

For the most demanding blue phosphorescent and TADF applications, TAPC (1,1-bis[4-(di-p-tolylamino)phenyl]cyclohexane) delivers the highest triplet energy among common EBL materials:

  • Triplet energy of 2.98 eV – exceeds blue PHOLED emitter requirements
  • Very high LUMO (-2.0 eV) – superior electron blocking
  • Established track record – extensively validated in high-efficiency blue devices

However, TAPC exhibits lower glass transition temperature (78°C) and documented chemical degradation pathways involving cyclohexyl ring rupture under extended operation. For applications requiring extended lifetime, TCTA or carbazole-based alternatives may prove more suitable.

Application-Specific Selection

Device requirements dictate optimal EBL material choice:

Blue Phosphorescent OLEDs Blue PHOLEDs emit from high-energy triplet states (ET ~2.6-2.8 eV), demanding EBL materials with triplet energies exceeding 2.8 eV to prevent quenching. TAPC (ET = 2.98 eV) and CzSi (ET = 3.02 eV) meet these stringent requirements. Without adequate triplet confinement, blue device efficiency collapses as excitons transfer to and decay non-radiatively within the EBL.

Green and Red PHOLEDs Lower emitter triplet energies (2.0-2.4 eV for red, 2.3-2.5 eV for green) permit broader EBL selection. TCTA provides excellent performance with superior stability compared to higher-ET alternatives.

TADF Devices Thermally activated delayed fluorescence devices require EBL materials that support the RISC (reverse intersystem crossing) process without introducing additional quenching pathways. Wide-bandgap materials with appropriate polarity matching optimize TADF emitter performance.

Fluorescent OLEDs Conventional fluorescent devices utilize only singlet excitons, relaxing triplet energy requirements. EBL selection focuses primarily on LUMO level and hole mobility rather than ET.

Solution-Processed Devices For solution-processed multilayer OLEDs, EBL materials must resist dissolution by subsequently deposited layers. Crosslinkable variants or orthogonal solvent systems address this challenge.

Dual and Multi-Function Materials

Many electron blocking layer compounds serve additional roles within OLED architectures:

EBL + HTL Materials like TAPC and TCTA frequently function as combined electron blocking and hole transport layers, simplifying device structures. The dual function works when hole mobility is sufficient and the material’s triplet energy exceeds emitter requirements.

EBL + Host TCTA and mCP serve as host materials in the emissive layer while simultaneously providing electron blocking at the HTL/EML interface. This approach reduces layer count and can improve charge balance within the emission zone.

Graded Structures Advanced architectures employ EBL materials in graded or mixed layers, creating smooth energy transitions that reduce charge accumulation and extend device lifetime.

EBL vs. HBL: Complementary Functions

Understanding the relationship between electron and hole blocking layers clarifies their distinct roles:

AspectEBLHBL
PositionBetween HTL and EMLBetween EML and ETL
BlocksElectrons (via high LUMO)Holes (via deep HOMO)
TransmitsHolesElectrons
Key parameterLUMO level, triplet energyHOMO level, triplet energy
Common materialsTCTA, TAPC, mCPBCP, TPBi, TmPyPB

Together, EBL and HBL create a “charge confinement zone” that traps both carrier types within the emissive layer, maximizing recombination efficiency and exciton generation.

Device Architecture Integration

Electron blocking layers function within precisely engineered OLED stacks:

Anode | HIL | HTL | EBL | EML (Host:Dopant) | HBL | ETL | EIL | Cathode

Related functional layers include:

Processing and Fabrication

Noctiluca EBL materials support standard deposition techniques:

Thermal Evaporation Most EBL compounds deposit cleanly via vacuum thermal evaporation at temperatures between 150-250°C. Our sublimation-purified materials (>99.99%) ensure consistent evaporation rates and contamination-free films.

Layer Thickness Optimization Typical EBL thicknesses range from 5-20 nm, balancing effective blocking against series resistance contributions. Thinner layers (<5 nm) may permit electron tunneling, while excessive thickness increases operating voltage.

Interface Quality EBL/EML interface morphology significantly impacts device performance. Atomically sharp interfaces minimize charge accumulation and associated degradation mechanisms.

The Noctiluca Advantage

Our electron blocking layer portfolio delivers critical performance benefits:

  • Ultra-high purity (>99.99%) – sublimation-grade materials eliminating quenching impurities
  • Batch-specific characterization – verified HOMO/LUMO levels, triplet energy, and thermal properties
  • Custom synthesis capability – modified EBL structures from 1g to 1kg quantities
  • Material selection guidance – application-specific recommendations for optimal device performance
  • Comprehensive portfolio – from industry standards to advanced high-ET compounds
  • 5th generation compatibility – EBL materials optimized for our proprietary PST and PSF emitter systems

From university research exploring fundamental device physics to industrial R&D optimizing commercial OLED performance, Noctiluca electron blocking layer materials enable the precise charge management essential for next-generation organic light-emitting devices.

Explore our EBL materials catalog or contact our OLED specialists for device architecture optimization.

Have any questions? Feel free to contact us!

Prefer a meeting? Schedule a date

Want to send a message? Fill out the form